US next-gen BAT laser system aims for a 10x efficiency boost for EUV chip production

[Redaktion]

Lawrence Livermore National Laboratory is developing an innovative petawatt laser system that could revolutionize chip manufacturing. This cutting-edge technology, part of the $12 million BAT laser project, aims to be ten times more efficient than the EUV lithography machines we use today.

https://www.notebookcheck.net/US-next-gen-BAT-laser-system-aims-for-a-10x-efficiency-boost-for-EUV-chip-production.943028.0.html